标题: | Impact of air filter material on metal oxide semiconductor (MOS) device characteristics in HF vapor environment |
作者: | Hsiao, CW Lou, JC Yeh, CF Hsieh, CM Lin, SJ Kusumi, T 电子工程学系及电子研究所 Department of Electronics Engineering and Institute of Electronics |
关键字: | contamination;glass fiber filter;HF vapor;PTFE filter;trace doping |
公开日期: | 15-五月-2004 |
摘要: | Airborne molecular contamination (AMC) is becoming increasingly important as devices are scaled down to the nanometer generation. Optimum ultra low penetration air (ULPA) filter technology can eliminate AMC. In a cleanroom, however, the acid vapor generated from the cleaning process may degrade the ULPA filter, releasing AMC to the air and the surface of wafers, degrading the electrical characteristics of devices. This work proposes the new PTFE ULPA filter, which is resistant to acid vapor corrosion, to solve this problem. Experimental results demonstrate that the PTFE ULPA filter can effectively eliminate the AMC and provide a very clean cleanroom environment. |
URI: | http://dx.doi.org/10.1143/JJAP.43.L659 http://hdl.handle.net/11536/26774 |
ISSN: | 0021-4922 |
DOI: | 10.1143/JJAP.43.L659 |
期刊: | JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS |
Volume: | 43 |
Issue: | 5B |
起始页: | L659 |
结束页: | L661 |
显示于类别: | Articles |
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