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dc.contributor.authorWang, MWen_US
dc.contributor.authorTsai, FHen_US
dc.contributor.authorChao, YFen_US
dc.date.accessioned2014-12-08T15:39:14Z-
dc.date.available2014-12-08T15:39:14Z-
dc.date.issued2004-05-01en_US
dc.identifier.issn0040-6090en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.tsf.2003.12.048en_US
dc.identifier.urihttp://hdl.handle.net/11536/26802-
dc.description.abstractThe modulation amplitude of a phase modulator is calibrated under a fixed incident angle in photoelastic modulation (PEM) ellipsometry. In addition to its modulation amplitude (Delta(o)), we also calibrated its static phase retardation at 632.8 nm. The ellipsometric parameters of a sample were measured by a multiple harmonic intensity ratio technique and proved that ellipsometric parameters can be obtained under various modulation amplitudes. Since the physical size of PEM is constant, we calibrated the modulation amplitude at multiple wavelengths by setting the Delta(o) value at 0.383 for 568.2 nm. These calibrations provided enough information for establishing an in situ/real time spectroscopic ellipsometry. (C) 2003 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectin situen_US
dc.subjectcalibrationen_US
dc.subjectphotoelastic modulatoren_US
dc.subjectellipsometryen_US
dc.titleIn situ calibration technique for photoelastic modulator in ellipsometryen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.doi10.1016/j.tsf.2003.12.048en_US
dc.identifier.journalTHIN SOLID FILMSen_US
dc.citation.volume455en_US
dc.citation.issueen_US
dc.citation.spage78en_US
dc.citation.epage83en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000221690000013-
Appears in Collections:Conferences Paper


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