标题: | In situ calibration technique for photoelastic modulator in ellipsometry |
作者: | Wang, MW Tsai, FH Chao, YF 光电工程学系 Department of Photonics |
关键字: | in situ;calibration;photoelastic modulator;ellipsometry |
公开日期: | 1-五月-2004 |
摘要: | The modulation amplitude of a phase modulator is calibrated under a fixed incident angle in photoelastic modulation (PEM) ellipsometry. In addition to its modulation amplitude (Delta(o)), we also calibrated its static phase retardation at 632.8 nm. The ellipsometric parameters of a sample were measured by a multiple harmonic intensity ratio technique and proved that ellipsometric parameters can be obtained under various modulation amplitudes. Since the physical size of PEM is constant, we calibrated the modulation amplitude at multiple wavelengths by setting the Delta(o) value at 0.383 for 568.2 nm. These calibrations provided enough information for establishing an in situ/real time spectroscopic ellipsometry. (C) 2003 Elsevier B.V. All rights reserved. |
URI: | http://dx.doi.org/10.1016/j.tsf.2003.12.048 http://hdl.handle.net/11536/26802 |
ISSN: | 0040-6090 |
DOI: | 10.1016/j.tsf.2003.12.048 |
期刊: | THIN SOLID FILMS |
Volume: | 455 |
Issue: | |
起始页: | 78 |
结束页: | 83 |
显示于类别: | Conferences Paper |
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