Nanomechanical properties of TiC, TiN and TiCN thin films using scanning probe microscopy and nanoindentation

doi:10.1016/j.apsusc.2004.01.053

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DC 欄位	值	語言
dc.contributor.author	Fang, TH	en_US
dc.contributor.author	Jian, SR	en_US
dc.contributor.author	Chuu, DS	en_US
dc.date.accessioned	2014-12-08T15:39:19Z	-
dc.date.available	2014-12-08T15:39:19Z	-
dc.date.issued	2004-04-30	en_US
dc.identifier.issn	0169-4332	en_US
dc.identifier.uri	http://dx.doi.org/10.1016/j.apsusc.2004.01.053	en_US
dc.identifier.uri	http://hdl.handle.net/11536/26859	-
dc.description.abstract	TiC, TiN and TiCN thin films deposited on silicon (1 0 0) substrates using plasma enhanced chemical vapor deposition (PECVD) was investigated by scanning probe microscopy (SPM) and nanoindentation techniques. Results showed that the TiC film exhibits lower surface roughness and friction coefficient than the TiN and the TiCN films. Young's modulus and hardness both decreased as the indentation depth increased for all the films and the TiC film exhibited a higher hardness and Young's modulus. Additionally. the contact stress-strain relationships and fractal dimension were also analyzed. (C) 2004 Elsevier B.V. All rights reserved.	en_US
dc.language.iso	en_US	en_US
dc.subject	SPM	en_US
dc.subject	nanoindentation	en_US
dc.subject	Young's modulus hardness	en_US
dc.subject	friction	en_US
dc.subject	fractal analysis	en_US
dc.title	Nanomechanical properties of TiC, TiN and TiCN thin films using scanning probe microscopy and nanoindentation	en_US
dc.type	Article	en_US
dc.identifier.doi	10.1016/j.apsusc.2004.01.053	en_US
dc.identifier.journal	APPLIED SURFACE SCIENCE	en_US
dc.citation.volume	228	en_US
dc.citation.issue	1-4	en_US
dc.citation.spage	365	en_US
dc.citation.epage	372	en_US
dc.contributor.department	電子物理學系	zh_TW
dc.contributor.department	Department of Electrophysics	en_US
dc.identifier.wosnumber	WOS:000221367000050	-
dc.citation.woscount	39	-
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