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dc.contributor.authorChen, HGen_US
dc.contributor.authorChang, Len_US
dc.date.accessioned2014-12-08T15:39:25Z-
dc.date.available2014-12-08T15:39:25Z-
dc.date.issued2004-04-01en_US
dc.identifier.issn0925-9635en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.diamond.2003.11.013en_US
dc.identifier.urihttp://hdl.handle.net/11536/26914-
dc.description.abstractDiamond deposition at a temperature above 1000 degreesC was carried out in a microwave plasma chemical vapor deposition reactor using a 3% CH4/H-2 gas mixture. A polycrystalline diamond substrate was coated with a thin film of nickel in 100-nm thickness before deposition. Electron microscopy characterization of electron diffraction, high-resolution imaging, and electron energy loss spectroscopy shows that the diamonds deposited exhibit regular shapes in triangles and parallelogram with well-faceted surfaces. These diamond platelets are single crystallites with a uniform thickness of approximately 30-70 nm and length of several hundred nanometers to a few micrometers. The platelet morphology suggests that it is formed by lateral growth. Also, it was found that the diamonds are covered with a 1 to 2-nm thick graphite films in epitaxy. (C) 2003 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectnanodiamonden_US
dc.subjecttransmission electron microscopy (TEM)en_US
dc.subjectmicrostructureen_US
dc.subjectelectron energy loss spectroscopyen_US
dc.titleCharacterization of diamond nanoplateletsen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.doi10.1016/j.diamond.2003.11.013en_US
dc.identifier.journalDIAMOND AND RELATED MATERIALSen_US
dc.citation.volume13en_US
dc.citation.issue4-8en_US
dc.citation.spage590en_US
dc.citation.epage594en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000221691100010-
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