完整後設資料紀錄
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dc.contributor.authorChang, LBen_US
dc.contributor.authorWang, SCen_US
dc.date.accessioned2014-12-08T15:39:41Z-
dc.date.available2014-12-08T15:39:41Z-
dc.date.issued2004-02-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://hdl.handle.net/11536/27101-
dc.description.abstractWe apply total internal reflection to significantly extend the effective length of KBe2BO3F2 crystal. Thus the conversion efficiency for second-harmonic generation can be increased in principle. However, the total reflection also leads to an adverse effect on the conversion efficiency. Three multiple-pass configurations to extend the effective interaction length of the crystal are proposed and discussed in this paper. Numerical analysis shows that the double-pass configuration is more favorable for second-harmonic generation to below 200 nm. At the medium input intensity of 200 MW/cm(2), the configuration gives a conversion of 27.1% at the second-harmonic wavelength of 193 nm. A conversion of 45.2% is obtained as the input intensity is increased to a higher value of 500 MW/cm(2).en_US
dc.language.isoen_USen_US
dc.subjectsecond-harmonic generation (SHG)en_US
dc.subjectsum-frequency generation (SFG)en_US
dc.subjectKBe2BO3F2 (KBBF)en_US
dc.subjectdeep ultravioleten_US
dc.subjecttotal internal reflectionen_US
dc.titleNumerical study of multiple-pass effect by total internal reflection on second-harmonic conversion in KBe2BO3F2 crystalen_US
dc.typeArticleen_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERSen_US
dc.citation.volume43en_US
dc.citation.issue2en_US
dc.citation.spage550en_US
dc.citation.epage558en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000220401000025-
dc.citation.woscount0-
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