完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | CHANG, KZ | en_US |
dc.contributor.author | WU, CY | en_US |
dc.date.accessioned | 2014-12-08T15:04:12Z | - |
dc.date.available | 2014-12-08T15:04:12Z | - |
dc.date.issued | 1994-01-01 | en_US |
dc.identifier.issn | 0038-1101 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1016/0038-1101(94)90110-4 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/2710 | - |
dc.description.abstract | The polysilicon high low-emitter (PHL-emitter) bipolar transistor with high current gain and zero activation energy at a certain collector current has been fabricated and characterized. It is shown that the higher current gain is mainly due to the narrower base width using the n- implant and the selectively implanted collector. However, the zero activation energy of the current gain at a certain collector current is caused by the two-dimensional flow of the base current. These features are very useful for analog circuit applications where the zero temperature-dependent current gain is required. | en_US |
dc.language.iso | en_US | en_US |
dc.title | NOVEL CHARACTERISTICS OF THE POLYSILICON HIGH-LOW-EMITTER (PHL-EMITTER) BIPOLAR-TRANSISTOR HIGH-CURRENT GAIN AND ZERO ACTIVATION-ENERGY | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1016/0038-1101(94)90110-4 | en_US |
dc.identifier.journal | SOLID-STATE ELECTRONICS | en_US |
dc.citation.volume | 37 | en_US |
dc.citation.issue | 1 | en_US |
dc.citation.spage | 93 | en_US |
dc.citation.epage | 96 | en_US |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:A1994MQ09900015 | - |
dc.citation.woscount | 0 | - |
顯示於類別: | 期刊論文 |