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dc.contributor.authorLin, CFen_US
dc.contributor.authorYao, HHen_US
dc.contributor.authorLu, JWen_US
dc.contributor.authorHsieh, YLen_US
dc.contributor.authorKuo, HCen_US
dc.contributor.authorWang, SCen_US
dc.date.accessioned2014-12-08T15:39:44Z-
dc.date.available2014-12-08T15:39:44Z-
dc.date.issued2004-01-19en_US
dc.identifier.issn0022-0248en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.jcrysgro.2003.11.028en_US
dc.identifier.urihttp://hdl.handle.net/11536/27132-
dc.description.abstractThe resonant-cavity light-emitting diode (RC-LED) structure was grown by MOCVD. The structure of RC-LED consisted of a 3lambda InGaN/GaN MQW LED cavity between the top TiO2/SiO2 DBR (81.7%, reflectance) and the bottom AlN/GaN DBR (90.4%) stack. A stable 410 nm emission peak and a low thermally induced red-shift effect (0.12 nm/kA/cm(2)) were measured by varying the injection current density. The light output power of the full RC-LED device was three times higher than the RC-LED without top TiO2/SiO2 DBR layers under 600 A/cm(2) inject current density. The narrow line width of 7.4 nm, emission peak localization at 410 nm, and three times higher output power were caused by the resonance effect in this vertical cavity structure. (C) 2003 Published by Elsevier B.V.en_US
dc.language.isoen_USen_US
dc.subjectmetalorganic chemical vapor depositionen_US
dc.subjectAlN/GaNen_US
dc.subjectdistributed Bragg reflectorsen_US
dc.subjectGaNen_US
dc.subjectInGaN/GaNen_US
dc.subjectresonant-cavity light-emitting diodeen_US
dc.titleCharacteristics of stable emission GaN-based resonant-cavity light-emitting diodesen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.doi10.1016/j.jcrysgro.2003.11.028en_US
dc.identifier.journalJOURNAL OF CRYSTAL GROWTHen_US
dc.citation.volume261en_US
dc.citation.issue2-3en_US
dc.citation.spage359en_US
dc.citation.epage363en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000188500000031-
Appears in Collections:Conferences Paper


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