Interleaver technology: Comparisons and applications requirements

doi:10.1109/JLT.2003.822832

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	Cao, S	en_US
dc.contributor.author	Chen, J	en_US
dc.contributor.author	Damask, JN	en_US
dc.contributor.author	Doerr, CR	en_US
dc.contributor.author	Guiziou, L	en_US
dc.contributor.author	Harvey, G	en_US
dc.contributor.author	Hibino, Y	en_US
dc.contributor.author	Li, H	en_US
dc.contributor.author	Suzuki, S	en_US
dc.contributor.author	Wu, KY	en_US
dc.contributor.author	Xie, P	en_US
dc.date.accessioned	2014-12-08T15:39:50Z	-
dc.date.available	2014-12-08T15:39:50Z	-
dc.date.issued	2004-01-01	en_US
dc.identifier.issn	0733-8724	en_US
dc.identifier.uri	http://dx.doi.org/10.1109/JLT.2003.822832	en_US
dc.identifier.uri	http://hdl.handle.net/11536/27225	-
dc.description.abstract	An overview of interleaver technologies is presented, based on the workshop held at the Optical Fiber Communications Conference, March 23, 2003. The requirements for and several realizations of interleaver filters are detailed.	en_US
dc.language.iso	en_US	en_US
dc.subject	optical components	en_US
dc.subject	optical filters	en_US
dc.subject	wavelength division multiplexing (WDM)	en_US
dc.title	Interleaver technology: Comparisons and applications requirements	en_US
dc.type	Article; Proceedings Paper	en_US
dc.identifier.doi	10.1109/JLT.2003.822832	en_US
dc.identifier.journal	JOURNAL OF LIGHTWAVE TECHNOLOGY	en_US
dc.citation.volume	22	en_US
dc.citation.issue	1	en_US
dc.citation.spage	281	en_US
dc.citation.epage	289	en_US
dc.contributor.department	光電工程學系	zh_TW
dc.contributor.department	Department of Photonics	en_US
dc.identifier.wosnumber	WOS:000189007600037	-
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