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dc.contributor.authorCao, Sen_US
dc.contributor.authorChen, Jen_US
dc.contributor.authorDamask, JNen_US
dc.contributor.authorDoerr, CRen_US
dc.contributor.authorGuiziou, Len_US
dc.contributor.authorHarvey, Gen_US
dc.contributor.authorHibino, Yen_US
dc.contributor.authorLi, Hen_US
dc.contributor.authorSuzuki, Sen_US
dc.contributor.authorWu, KYen_US
dc.contributor.authorXie, Pen_US
dc.date.accessioned2014-12-08T15:39:50Z-
dc.date.available2014-12-08T15:39:50Z-
dc.date.issued2004-01-01en_US
dc.identifier.issn0733-8724en_US
dc.identifier.urihttp://dx.doi.org/10.1109/JLT.2003.822832en_US
dc.identifier.urihttp://hdl.handle.net/11536/27225-
dc.description.abstractAn overview of interleaver technologies is presented, based on the workshop held at the Optical Fiber Communications Conference, March 23, 2003. The requirements for and several realizations of interleaver filters are detailed.en_US
dc.language.isoen_USen_US
dc.subjectoptical componentsen_US
dc.subjectoptical filtersen_US
dc.subjectwavelength division multiplexing (WDM)en_US
dc.titleInterleaver technology: Comparisons and applications requirementsen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.doi10.1109/JLT.2003.822832en_US
dc.identifier.journalJOURNAL OF LIGHTWAVE TECHNOLOGYen_US
dc.citation.volume22en_US
dc.citation.issue1en_US
dc.citation.spage281en_US
dc.citation.epage289en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000189007600037-
Appears in Collections:Conferences Paper


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