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dc.contributor.authorLai, SHen_US
dc.contributor.authorHuang, KPen_US
dc.contributor.authorPan, YMen_US
dc.contributor.authorChen, YLen_US
dc.contributor.authorChan, LHen_US
dc.contributor.authorLin, Pen_US
dc.contributor.authorShih, HCen_US
dc.date.accessioned2014-12-08T15:39:59Z-
dc.date.available2014-12-08T15:39:59Z-
dc.date.issued2003-12-15en_US
dc.identifier.issn0009-2614en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.cplett.2003.10.106en_US
dc.identifier.urihttp://hdl.handle.net/11536/27320-
dc.description.abstractThe fluorinated amorphous carbon nanoparticles (a-C:F NPs) films have been prepared on a porous alumina at a lower temperature of similar to100 degreesC by an ECR-CVD system with a mixture of CF4, C2H2 and Ar as precursors. The morphology of a-C:F NPs films was verified by FESEM. The microstructure and chemical bonding nature of the a-C:F NPs films were investigated by Raman spectroscopy and XPS, respectively. The fluorinated samples need a lower field (similar to2.25 V/mum for 10.6% F a-C:F NPs films) to emit the electron than unfluorinated ones. The excellent field-emission properties of a-C:F NPs films are due to the effect of the shape, fluorine doping and dangling bonds. (C) 2003 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.titleElectron field emission from fluorinated amorphous carbon nanoparticles on porous aluminaen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.cplett.2003.10.106en_US
dc.identifier.journalCHEMICAL PHYSICS LETTERSen_US
dc.citation.volume382en_US
dc.citation.issue5-6en_US
dc.citation.spage567en_US
dc.citation.epage572en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000187245800013-
dc.citation.woscount12-
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