NOVEL FABRICATION TECHNIQUE TOWARDS QUANTUM DOTS

doi:10.1063/1.110133

Title:	NOVEL FABRICATION TECHNIQUE TOWARDS QUANTUM DOTS
Authors:	LIU, DC LEE, CP 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics
Issue Date:	20-Dec-1993
Abstract:	A novel technique for semiconductor quantum dots fabrication is demonstrated. Using the technique of thermal etching or thermal evaporation during molecular beam epitaxial growth with a built-in evaporation mask, semiconductor quantum dots were obtained in a single growth run.
URI:	http://dx.doi.org/10.1063/1.110133 http://hdl.handle.net/11536/2739
ISSN:	0003-6951
DOI:	10.1063/1.110133
Journal:	APPLIED PHYSICS LETTERS
Volume:	63
Issue:	25
Begin Page:	3503
End Page:	3505
Appears in Collections:	Articles