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dc.contributor.authorLU, MCen_US
dc.contributor.authorROAM, GDen_US
dc.contributor.authorCHEN, JNen_US
dc.contributor.authorHUANG, CPen_US
dc.date.accessioned2014-12-08T15:04:15Z-
dc.date.available2014-12-08T15:04:15Z-
dc.date.issued1993-12-01en_US
dc.identifier.issn1010-6030en_US
dc.identifier.urihttp://hdl.handle.net/11536/2747-
dc.description.abstractThe photocatalytic degradation of organophosphorus insecticide, dichlorvos, on glass-supported titanium dioxide was investigated. The photoreactor coated with titanium dioxide was illuminated with a 20 W black-light W fluorescent tube. The aqueous solution containing dichlorvos was continuously pumped through the photoreactor. Several factors, such as the initial dichlorvos concentration, dissolved oxygen, electrolytes, flow rate and temperature, affecting the oxidation rate of dichlorvos were studied. The results indicate that photocatalysis can be an effective process for the degradation of dichlorvos. The activated energy for the photocatalytic degradation of dichlorvos is 28.4 kJ mol(-1). The initial quantum yield for the destruction of dichlorvos is 2.67%. Increasing the flow rate and initial dichlorvos concentration increases the dichlorvos degradation rate. Total mineralization requires a much longer illumination time than the disappearance of dichlorvos. Phosphate-containing intermediates are more stable than chloride-containing intermediates. It is shown that the photocatalytic oxidation of dichlorvos follows the Langmuir-Hinshelwood-type behavior, and reaction byproducts display an inhibiting effect on degradation rate.en_US
dc.language.isoen_USen_US
dc.titleFACTORS AFFECTING THE PHOTOCATALYTIC DEGRADATION OF DICHLORVOS OVER TITANIUM-DIOXIDE SUPPORTED ON GLASSen_US
dc.typeArticleen_US
dc.identifier.journalJOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY A-CHEMISTRYen_US
dc.citation.volume76en_US
dc.citation.issue1-2en_US
dc.citation.spage103en_US
dc.citation.epage110en_US
dc.contributor.department環境工程研究所zh_TW
dc.contributor.departmentInstitute of Environmental Engineeringen_US
dc.identifier.wosnumberWOS:A1993MP95500016-
dc.citation.woscount95-
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