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dc.contributor.authorChen, Kuang Yaoen_US
dc.contributor.authorYang, Chun-Kaien_US
dc.contributor.authorLiang, C. -T.en_US
dc.contributor.authorAoki, N.en_US
dc.contributor.authorOchiai, Y.en_US
dc.contributor.authorUjiie, Y.en_US
dc.contributor.authorCheng, K. A.en_US
dc.contributor.authorLin, Li-Hungen_US
dc.contributor.authorHuang, C. F.en_US
dc.contributor.authorLi, Yu-Ruen_US
dc.contributor.authorTseng, Yen Shungen_US
dc.contributor.authorLin, Po-Tsunen_US
dc.contributor.authorWu, Jau-Yangen_US
dc.contributor.authorLin, Sheng-Dien_US
dc.date.accessioned2014-12-08T15:40:21Z-
dc.date.available2014-12-08T15:40:21Z-
dc.date.issued2009-07-01en_US
dc.identifier.issn0374-4884en_US
dc.identifier.urihttp://dx.doi.org/10.3938/jkps.55.173en_US
dc.identifier.urihttp://hdl.handle.net/11536/27554-
dc.description.abstractHybrid ferromagnet/semiconductor systems have been the focus of considerable attention because of the transport properties of two-dimensional electron systems and their potential applications to magnetic storage and sensing devices. We use the weak localization effect to probe the dephasing mechanism at low temperatures. In our study, the zero-temperature phase-relaxation rate can be enhanced in a hybrid ferromagnet/semiconductor system, which may he due to the inhomogeneous magnetic field emanating from the Ni film. The result may improve understanding of the issue of zero-temperature dephasing in disordered systems.en_US
dc.language.isoen_USen_US
dc.subjectTwo-dimensional electron systemen_US
dc.subjectHybrid ferromagnet/semiconductor systemen_US
dc.subjectPhase-relaxation rateen_US
dc.titleEnhanced Phase Relaxation in a Hybrid Ferromagnet/Semiconductor Systemen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.doi10.3938/jkps.55.173en_US
dc.identifier.journalJOURNAL OF THE KOREAN PHYSICAL SOCIETYen_US
dc.citation.volume55en_US
dc.citation.issue1en_US
dc.citation.spage173en_US
dc.citation.epage176en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000268023600039-
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