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dc.contributor.authorChen, CFen_US
dc.contributor.authorTsai, CLen_US
dc.contributor.authorLin, CLen_US
dc.date.accessioned2014-12-08T15:40:25Z-
dc.date.available2014-12-08T15:40:25Z-
dc.date.issued2003-09-01en_US
dc.identifier.issn0925-9635en_US
dc.identifier.urihttp://dx.doi.org/10.1016/S0925-9635(03)00181-Xen_US
dc.identifier.urihttp://hdl.handle.net/11536/27590-
dc.description.abstractIn this study, we directly synthesized boron-doped carbon nanotubes (CNTs) by using trimethylborate (B(OCH3)(3)) as doping sources in a microwave plasma chemical vapor deposition system (MPCVD). Doping boron causes the growth rate of CNTs to decrease. This might be due to the high oxygen content contained in the doping source that induces oxidation of graphite. The bamboo-like nanostructure of the carbon tubes disappeared with boron doping. Raman spectrum shows the higher I-D/I-G ratio in boron-doped CNTs. This implies the decrease of graphitization in boron-doped CNTs. In addition, doping boron could enhance the field emission property by increasing the current density by more than 30% (from 350 to 470 mA/cm(2) at 2.2 V/mum). (C) 2003 Elsevier Science B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectnanotubesen_US
dc.subjectp-type dopingen_US
dc.subjectchemical vapor depositionen_US
dc.subjectfield emissionen_US
dc.titleThe characterization of boron-doped carbon nanotube arraysen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/S0925-9635(03)00181-Xen_US
dc.identifier.journalDIAMOND AND RELATED MATERIALSen_US
dc.citation.volume12en_US
dc.citation.issue9en_US
dc.citation.spage1500en_US
dc.citation.epage1504en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000185308900010-
dc.citation.woscount22-
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