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dc.contributor.authorHsu, YKen_US
dc.contributor.authorChang, CSen_US
dc.contributor.authorHsieh, WFen_US
dc.date.accessioned2014-12-08T15:40:39Z-
dc.date.available2014-12-08T15:40:39Z-
dc.date.issued2003-07-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.42.4222en_US
dc.identifier.urihttp://hdl.handle.net/11536/27730-
dc.description.abstractThe Er-doped GaSe crystal has been investigated by using temperature dependent photoluminescence (TDPL), a Fourier-transform infrared spectrometer (FTIR), and Hall effect measurements. The Er-doped GaSe appears to be a p-type semiconductor. The impurity level at similar to2.064 eV is observed and located at similar to64 meV above the valence band in both the as-grown and the annealed Er doped GaSe crystal. Additionally, the infrared luminescence and transmission spectra which have arisen from the intracenter transitions 4I(9/2) --> 4I(15/2), 4I(11/2) --> 4I(15/2), and 4I(13/2) --> 4I(15/2) of erbium ions have been observed at similar to0.81, 0.99, and 1.54 mum, respectively. The annealing process under excess Se atmosphere at 600degreesC for 72 h can enhance the crystal to have more active erbium ions.en_US
dc.language.isoen_USen_US
dc.subjectGaSeen_US
dc.subjectBridgmann growthen_US
dc.subjecterbiumen_US
dc.subjectphotoluminescenceen_US
dc.titlePhotoluminescence study of GaSe doped with Eren_US
dc.typeArticleen_US
dc.identifier.doi10.1143/JJAP.42.4222en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERSen_US
dc.citation.volume42en_US
dc.citation.issue7Aen_US
dc.citation.spage4222en_US
dc.citation.epage4225en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000184662000009-
dc.citation.woscount6-
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