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dc.contributor.authorChen, JKen_US
dc.contributor.authorKo, FHen_US
dc.contributor.authorChen, HLen_US
dc.contributor.authorChang, FCen_US
dc.date.accessioned2014-12-08T15:40:48Z-
dc.date.available2014-12-08T15:40:48Z-
dc.date.issued2003-06-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.42.3838en_US
dc.identifier.urihttp://hdl.handle.net/11536/27815-
dc.description.abstractThe novel sensitivity curve was determined for the zwitterresist. The irradiation dose in the center could create a ring pattern due to simultaneous exhibition of the positive tone and negative tone of zwitterresist. The natural logarithm dependence of ring width and electron beam dose was linear in two ranges, irrespective of the dot design radius. The heating effect was identified from 600 muC/cm(2), while it could be neglected at less than 600 muC/cm(2). Mathematical modeling for the prediction of ring width for zwitterresist, was achieved by considering the electron scattering and heating effects. The results of experimental measurement and modeling on ring width showed a very good correlation.en_US
dc.language.isoen_USen_US
dc.subjectzwitterresisten_US
dc.subjectelectron beamen_US
dc.subjectheating effecten_US
dc.subjectring patternen_US
dc.subjectthroughputen_US
dc.titleMechanism and modeling of ring pattern formation for electron beam exposure on Zwitterresisten_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.doi10.1143/JJAP.42.3838en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERSen_US
dc.citation.volume42en_US
dc.citation.issue6Ben_US
dc.citation.spage3838en_US
dc.citation.epage3841en_US
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.identifier.wosnumberWOS:000184373400020-
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