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dc.contributor.authorWang, DYen_US
dc.contributor.authorChien, CHen_US
dc.contributor.authorChang, CYen_US
dc.contributor.authorLeu, CCen_US
dc.contributor.authorYang, JYen_US
dc.contributor.authorChuang, SHen_US
dc.contributor.authorHuang, TYen_US
dc.date.accessioned2014-12-08T15:40:56Z-
dc.date.available2014-12-08T15:40:56Z-
dc.date.issued2003-05-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.42.2756en_US
dc.identifier.urihttp://hdl.handle.net/11536/27893-
dc.description.abstractThe properties of sol-gel-derived 120-nm PbZr0.52Ti0.48O3 thin films crystallized in low-pressure O-2 ambient at 500degreesC have been investigated. it is found that PbZr0.52Ti0.48O3 films crystallized in low-pressure oxygen ambient exhibit higher remanent polarization as well as a lower coercive field, compared to those annealed in O-2 atmosphere. The remanent polarization (i.e., 2P(r)) for samples annealed in 60 mbar O-2 ambient is as high as 36 muC/cm(2), and the coercive field (2E(C)) is 99.9 kV/cm at an applied voltage of 2 V. The improvement of P-E hysteresis loops by low-pressure oxygen annealing is ascribed to less incorporation of oxygen and other residues in the resultant PbZr0.52Ti0.48O3 films, since the reductions in the amount of these residual species are beneficial for the complete transformation of the perovskite structure. The reductions in oxygen content and amounts of other residues such as CO2 and H2O are confirmed based on Auger depth profiles and thermal desorption spectra (TDS), respectively.en_US
dc.language.isoen_USen_US
dc.subjectlow pressureen_US
dc.subjectlow temperatureen_US
dc.subjectPZTen_US
dc.subjectsol-gelen_US
dc.subjectferroelectricen_US
dc.titleLow-pressure crystallization of sol-gel-derived PbZr0.52Ti0.48O3 thin films at low temperature for low-voltage operationen_US
dc.typeArticleen_US
dc.identifier.doi10.1143/JJAP.42.2756en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERSen_US
dc.citation.volume42en_US
dc.citation.issue5Aen_US
dc.citation.spage2756en_US
dc.citation.epage2758en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000183744900043-
dc.citation.woscount4-
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