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dc.contributor.authorPan, RPen_US
dc.contributor.authorChiu, HYen_US
dc.contributor.authorLin, YFen_US
dc.contributor.authorHuang, JYen_US
dc.date.accessioned2014-12-08T15:41:09Z-
dc.date.available2014-12-08T15:41:09Z-
dc.date.issued2003-04-01en_US
dc.identifier.issn0577-9073en_US
dc.identifier.urihttp://hdl.handle.net/11536/27997-
dc.description.abstractThe characteristics of UV-modified polyimide CBDA-BAPP films for liquid crystal (LC) alignment have been investigated. Linearly polarized ultra-violet laser light (lambda = 325 nm) was used to expose the film. The LC direction of this film tends to be oriented parallel to the surface and perpendicular to the polarization direction of the laser light. The uniformity of the LC direction stabilizes when the exposure time exceeds a certain length. From the atomic force microscope investigation, we find that the films have been dented at the places exposed to the laser light. When a mask with striped pattern was used during exposure, we observed grooves in the exposed regions. The grooved patterns agree well with the calculated diffraction patterns caused by the mask, however, the groove direction has no effect on the alignment of the LCs. In our experiments, we also achieved LC alignment patterns as small as 2 mum using UV exposure with a mask.en_US
dc.language.isoen_USen_US
dc.titleSurface topography and alignment effects in UV-modified polyimide films with micron size patternsen_US
dc.typeArticleen_US
dc.identifier.journalCHINESE JOURNAL OF PHYSICSen_US
dc.citation.volume41en_US
dc.citation.issue2en_US
dc.citation.spage177en_US
dc.citation.epage184en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000182304900010-
dc.citation.woscount4-
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