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dc.contributor.authorHUANG, HSen_US
dc.contributor.authorCHANG, CYen_US
dc.contributor.authorHSU, CCen_US
dc.contributor.authorCHEN, KLen_US
dc.contributor.authorLIN, JKen_US
dc.date.accessioned2014-12-08T15:04:18Z-
dc.date.available2014-12-08T15:04:18Z-
dc.date.issued1993-11-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.32.4928en_US
dc.identifier.urihttp://hdl.handle.net/11536/2805-
dc.description.abstractA new latch-up phenomenon that shows symmetrical diac I-V characteristics has been discovered recently. Electrical measurements show that a diac parasitic semiconductor-controlled-rectifier (SCR) device can exist between two adjacent electro static discharge damage (ESD) protection circuits or output buffers. The SCR consists of two parasitic P-N-P-N paths and can easily induce a localized SCR latch-up between two adjacent input or output terminals. This is not similar to traditional latch-up that creates a parasitic P-N-P-N path between power supply and ground pins, but is a new bilateral latch-up path between two adjacent input and output pins. A new latch-up failure mode due to this diac structure, which creates a bilateral path during temperature humidity bias (THB) testing, is discussed. Some suggestions regarding the improvement of this diac latch-up degradation are proposed. Advanced analyses and modeling are also presented in this paper. The modified diac latch-up lumped element model successfull explains this phenomenon.en_US
dc.language.isoen_USen_US
dc.subjectVLSIen_US
dc.subjectESDen_US
dc.subjectLATCH-UPen_US
dc.subjectDIACen_US
dc.subjectSCR AND BILATERALen_US
dc.titleTHE BEHAVIOR OF BILATERAL LATCH-UP TRIGGERING IN VLSI ELECTROSTATIC DISCHARGE DAMAGE PROTECTION CIRCUITSen_US
dc.typeArticleen_US
dc.identifier.doi10.1143/JJAP.32.4928en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERSen_US
dc.citation.volume32en_US
dc.citation.issue11Aen_US
dc.citation.spage4928en_US
dc.citation.epage4933en_US
dc.contributor.department電控工程研究所zh_TW
dc.contributor.departmentInstitute of Electrical and Control Engineeringen_US
dc.identifier.wosnumberWOS:A1993ML96600013-
dc.citation.woscount0-
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