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dc.contributor.authorCHIN, Aen_US
dc.contributor.authorCHENG, TMen_US
dc.contributor.authorPENG, SPen_US
dc.contributor.authorOSMAN, Zen_US
dc.contributor.authorDAS, Uen_US
dc.contributor.authorCHANG, CYen_US
dc.date.accessioned2014-12-08T15:04:18Z-
dc.date.available2014-12-08T15:04:18Z-
dc.date.issued1993-10-25en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.110481en_US
dc.identifier.urihttp://hdl.handle.net/11536/2812-
dc.description.abstractStrong enhancement in the luminescence intensity is observed in Al0.22Ga0.78As epitaxial layers grown on misoriented (111)B GaAs at 636-degrees-C. For 3-degrees misorientation, the luminescence intensity is almost 10 times that of (100) layers and the luminescence efficiency is an order of magnitude stronger than that of (100). (100) Al0.4Ga0.6As/GaAs quantum well laser diode structures grown under identical conditions with a low threshold current density of 150 A/cm2 are indications of excellent AlGaAs material quality. Electron mobility for 3-degrees misoriented (111) Al0.25Ga0.75As is about 10% higher than that for side-by-side grown (100). The strong luminescence associated with a large red shift of 90 meV, the 10% mobility enhancement, and wirelike structure shown in transmission electron microscopy are indicative of the natural formation of quantized structures.en_US
dc.language.isoen_USen_US
dc.titleSTRONG LUMINESCENCE INTENSITIES IN AL0.22GA0.78AS GROWN ON MISORIENTED (111)B GAASen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.110481en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume63en_US
dc.citation.issue17en_US
dc.citation.spage2381en_US
dc.citation.epage2383en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:A1993MD95900025-
dc.citation.woscount14-
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