完整後設資料紀錄
DC 欄位語言
dc.contributor.authorChou, HYen_US
dc.contributor.authorTseng, TYen_US
dc.contributor.authorChen, TMen_US
dc.date.accessioned2014-12-08T15:41:36Z-
dc.date.available2014-12-08T15:41:36Z-
dc.date.issued2003en_US
dc.identifier.isbn0-87849-924-5en_US
dc.identifier.issn1013-9826en_US
dc.identifier.urihttp://hdl.handle.net/11536/28288-
dc.description.abstractIn this work, we have investigated the effect of bismuth content on electrical properties of Sr0.8Bi2+xTa2O9+delta (SBT) thin films, obtained by using the metallorganic decomposition technique. The SBT precursor solution was prepared using high purity strontium acetate, bismuth acetate and tantalum ethoxide as the starting materials and acetic acid as the solvent. Thin films were deposited on Ir(50nm)/SiO2(100Mn)/Si substrates by spin coating with precise control of the solution viscosity and spin speed. As-deposited films were dried at 150degreesC for 10 min followed by pyrolysis at 400degreesC for 30 min in static air to remove the solvent and organic impurities. The films were then post-annealed at 650degreesC for 30 min in ambient oxygen atmosphere. The crystallinity of SBT thin films containing various bismuth levels was characterized by X-ray diffraction (XRD). The 30% Bi excess SBT thin films exhibited preferentially (115) oriented phase. The XRD pattern showed all major peaks corresponding to SBT phase. The microstructure, P-E hysteresis loops and leakage current of SBT films were found to be dependent on the bismuth content.en_US
dc.language.isoen_USen_US
dc.subjectferroelectricen_US
dc.subjectMODen_US
dc.subjectSBT thin filmsen_US
dc.titleVariation of electrical properties of Sro(0.8)Bi(2+x)Ta(2)O(9+delta) ferroelectric thin films with bismuth contenten_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.journalADVANCED CERAMICS AND COMPOSITESen_US
dc.citation.volume247en_US
dc.citation.spage381en_US
dc.citation.epage384en_US
dc.contributor.department應用化學系zh_TW
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000185045800080-
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