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dc.contributor.authorChen, YFen_US
dc.date.accessioned2014-12-08T15:41:46Z-
dc.date.available2014-12-08T15:41:46Z-
dc.date.issued2002-11-01en_US
dc.identifier.issn0039-6028en_US
dc.identifier.urihttp://dx.doi.org/10.1016/S0039-6028(02)02206-9en_US
dc.identifier.urihttp://hdl.handle.net/11536/28400-
dc.description.abstractThe spatially varying inelastic mean free paths of photoelectrons emitted from a solid surface have been calculated from an extended Drude dielectric function, that considers the characteristic oscillator strength, damping constant, and critical-point energy for each subband of valence electrons. The results reveal that the additional inelastic scattering probability due to surface effects can be regarded as a surface excitation probability on the vacuum side and can be taken into account by use of a surface excitation parameter. The X-ray-photoelectron spectroscopy formalism in which elastic-scattering effects have been accounted for has been extended to include surface effects. The results show that surface effects lead to a reduction of photoelectron intensities at small emission angles and a sharp decrease at large angles (>75degrees) since surface excitations are most probable for glancing electrons. However, the difference between the results obtained with and without surface effects for emission angles less than 60degrees are small because of the method by which the results were normalized. (C) 2002 Elsevier Science B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectX-ray photoelectron spectroscopyen_US
dc.subjectdielectric phenomenaen_US
dc.subjectelectron emissionen_US
dc.titleSurface effects on angular distributions in X-ray-photoelectron spectroscopyen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/S0039-6028(02)02206-9en_US
dc.identifier.journalSURFACE SCIENCEen_US
dc.citation.volume519en_US
dc.citation.issue1-2en_US
dc.citation.spage115en_US
dc.citation.epage124en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000179076300014-
dc.citation.woscount81-
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