完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | CHEN, HR | en_US |
dc.contributor.author | LEE, CP | en_US |
dc.contributor.author | CHANG, CY | en_US |
dc.contributor.author | TSAI, KL | en_US |
dc.contributor.author | TSANG, JS | en_US |
dc.date.accessioned | 2014-12-08T15:04:20Z | - |
dc.date.available | 2014-12-08T15:04:20Z | - |
dc.date.issued | 1993-10-01 | en_US |
dc.identifier.issn | 0021-4922 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/2842 | - |
dc.description.abstract | The potential spike energy at the emitter junction of AlGaAs/GaAs heterostructure emitter bipolar transistors (HEBT) was directly measured for the first time. Experimental data revealed that emitter thickness as thin as 300 angstrom is thick enough to eliminate potential spike without compositional grading. It is found that the band bending in n-GaAs reduces the potential spike and hence very low offset voltage of 70 mV with high current gain of 150 can be obtained. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | HEBT | en_US |
dc.subject | POTENTIAL SPIKE | en_US |
dc.subject | BAND BENDING | en_US |
dc.subject | OFFSET VOLTAGE | en_US |
dc.title | EVIDENCE OF ZERO POTENTIAL SPIKE ENERGY IN ALGAAS GAAS HETEROSTRUCTURE EMITTER BIPOLAR-TRANSISTORS | en_US |
dc.type | Article | en_US |
dc.identifier.journal | JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | en_US |
dc.citation.volume | 32 | en_US |
dc.citation.issue | 10A | en_US |
dc.citation.spage | L1397 | en_US |
dc.citation.epage | L1399 | en_US |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:A1993MC04400009 | - |
dc.citation.woscount | 6 | - |
顯示於類別: | 期刊論文 |