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dc.contributor.authorLin, Chih-Yangen_US
dc.contributor.authorLiu, Chih-Yien_US
dc.contributor.authorLin, Chun-Chiehen_US
dc.contributor.authorTseng, T. Y.en_US
dc.date.accessioned2014-12-08T15:42:10Z-
dc.date.available2014-12-08T15:42:10Z-
dc.date.issued2008-12-01en_US
dc.identifier.issn1385-3449en_US
dc.identifier.urihttp://dx.doi.org/10.1007/s10832-007-9081-yen_US
dc.identifier.urihttp://hdl.handle.net/11536/28654-
dc.description.abstractSeveral emerging nonvolatile memories (NVMs) such as ferroelectric memory, magnetoresistive rams and ovonic universal memory are being developed for possible applications. Resistive random access memory (RRAM) is another interesting competitor in the class of NVMs. The RRAM is based on a large change in electrical resistance when the memory film is exposed to voltage or current pulses, and can keep high or low resistance states without any power. The ideal RRAM Should have the superior properties of reversible switching, long retention tune, multilevel switching, simple structure, small size, and low operating voltage. Perovskite oxides, transition metal oxides, and molecular materials were found to have resistive memory properties. This presentation reviews the ongoing research and development activities on future resistance NVMs technologies incorporating these new memory materials. The possible basic mechanisms for their bistable resistance switching are described. The effect of processing, composition, and structure on the properties of resistive memory materials and consequently the devices are discussed.en_US
dc.language.isoen_USen_US
dc.subjectNonvolatile memoriesen_US
dc.subjectResistance random access memory (RRAM)en_US
dc.subjectPerovskite oxidesen_US
dc.subjectTransition metal oxidesen_US
dc.subjectMolecular materialsen_US
dc.titleCurrent status of resistive nonvolatile memoriesen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.doi10.1007/s10832-007-9081-yen_US
dc.identifier.journalJOURNAL OF ELECTROCERAMICSen_US
dc.citation.volume21en_US
dc.citation.issue1-4en_US
dc.citation.spage61en_US
dc.citation.epage66en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000262833200013-
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