Full metadata record
DC FieldValueLanguage
dc.contributor.authorGUO, JYen_US
dc.contributor.authorWU, CYen_US
dc.date.accessioned2014-12-08T15:04:22Z-
dc.date.available2014-12-08T15:04:22Z-
dc.date.issued1993-09-01en_US
dc.identifier.issn0018-9383en_US
dc.identifier.urihttp://dx.doi.org/10.1109/16.231571en_US
dc.identifier.urihttp://hdl.handle.net/11536/2868-
dc.description.abstractThe exact solution of the 2D Poisson's equation for the fully depleted SOI MOSFET's is derived by using a three-zone Green's function solution technique. Based on the derived 2D potential distribution, the front and back surface potential distributions in the Si film are analytically obtained and their accuracy are verified by 2D numerical analysis. The calculated minimum surface potential and its location are used to analyze the drain-induced barrier-lowering effect and further to develop an analytic threshold-voltage model. Comparisons between the developed analytic threshold-voltage model and the 2D numerical analysis are made. It is shown that excellent agreements are obtained for wide ranges of device structure parameters and applied biases.en_US
dc.language.isoen_USen_US
dc.titleA NEW 2D ANALYTIC THRESHOLD-VOLTAGE MODEL FOR FULLY DEPLETED SHORT-CHANNEL SOI MOSFETSen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/16.231571en_US
dc.identifier.journalIEEE TRANSACTIONS ON ELECTRON DEVICESen_US
dc.citation.volume40en_US
dc.citation.issue9en_US
dc.citation.spage1653en_US
dc.citation.epage1661en_US
dc.contributor.department電控工程研究所zh_TW
dc.contributor.departmentInstitute of Electrical and Control Engineeringen_US
dc.identifier.wosnumberWOS:A1993LU39400012-
dc.citation.woscount26-
Appears in Collections:Articles


文件中的檔案:

  1. A1993LU39400012.pdf

If it is a zip file, please download the file and unzip it, then open index.html in a browser to view the full text content.