完整後設資料紀錄
DC 欄位 | 值 | 語言 |
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dc.contributor.author | Hsu, Chiung-Chih | en_US |
dc.contributor.author | Hsu, Ray-Quen | en_US |
dc.contributor.author | Wu, Yue-Han | en_US |
dc.contributor.author | Chi, Tung-Wei | en_US |
dc.contributor.author | Chiang, Chen-Hao | en_US |
dc.contributor.author | Chen, Jenn-Fang | en_US |
dc.contributor.author | Chang, Mao-Nan | en_US |
dc.date.accessioned | 2014-12-08T15:42:27Z | - |
dc.date.available | 2014-12-08T15:42:27Z | - |
dc.date.issued | 2008-10-01 | en_US |
dc.identifier.issn | 0304-3991 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1016/j.ultramic.2008.04.098 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/28831 | - |
dc.description.abstract | Quantum dots (QDs) have great potential in optical fiber communication applications were widely recognized. The structure of molecular beam epitaxy (MBE) grew InAsN QDs were investigated by transmission electron microscopy (TEM) and measured their optical properties by photoluminescence (PL). TEM images show that the InAsN QDs are irregular or oval shaped. Some of the InAsN QDs are observed to have defects, such as dislocations at or near the surface in contrast to InAs QDs, which appear to be defect free. PL results for InAsN QDs showed a red-shifted emission peak. In addition, the InAsN emission peak is broader than InAs QDs, which supports the TEM observation that the size distribution of the InAsN QDs is more random than InAs QDs. The results show that the addition of nitrogen to InAs QDs leads to a decrease in the average size of the QDs, bring changes in the QD's shape, compositional distribution, and optical properties. (C) 2008 Published by Elsevier B.V. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | Quantum dots | en_US |
dc.subject | TEM | en_US |
dc.subject | PL | en_US |
dc.subject | Molecular beam epitaxy | en_US |
dc.title | Analysis of InAsN quantum dots by transmission electron microscopy and photoluminescence | en_US |
dc.type | Article; Proceedings Paper | en_US |
dc.identifier.doi | 10.1016/j.ultramic.2008.04.098 | en_US |
dc.identifier.journal | ULTRAMICROSCOPY | en_US |
dc.citation.volume | 108 | en_US |
dc.citation.issue | 11 | en_US |
dc.citation.spage | 1495 | en_US |
dc.citation.epage | 1499 | en_US |
dc.contributor.department | 機械工程學系 | zh_TW |
dc.contributor.department | 材料科學與工程學系 | zh_TW |
dc.contributor.department | 電子物理學系 | zh_TW |
dc.contributor.department | Department of Mechanical Engineering | en_US |
dc.contributor.department | Department of Materials Science and Engineering | en_US |
dc.contributor.department | Department of Electrophysics | en_US |
dc.identifier.wosnumber | WOS:000260518200015 | - |
顯示於類別: | 會議論文 |