Metalorganic chemical vapor deposition of tungsten carbonitride films by bis(tertbutylimido)bis(diethylamido)tungsten.

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	Chuang, SH	en_US
dc.contributor.author	Chiu, HT	en_US
dc.contributor.author	Chou, YH	en_US
dc.contributor.author	Chang, YH	en_US
dc.contributor.author	Chen, SF	en_US
dc.contributor.author	Yang, JY	en_US
dc.date.accessioned	2014-12-08T15:42:31Z	-
dc.date.available	2014-12-08T15:42:31Z	-
dc.date.issued	2002-04-07	en_US
dc.identifier.issn	0065-7727	en_US
dc.identifier.uri	http://hdl.handle.net/11536/28866	-
dc.language.iso	en_US	en_US
dc.title	Metalorganic chemical vapor deposition of tungsten carbonitride films by bis(tertbutylimido)bis(diethylamido)tungsten.	en_US
dc.type	Meeting Abstract	en_US
dc.identifier.journal	ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY	en_US
dc.citation.volume	223	en_US
dc.citation.issue		en_US
dc.citation.spage	A48	en_US
dc.citation.epage	A48	en_US
dc.contributor.department	應用化學系	zh_TW
dc.contributor.department	Department of Applied Chemistry	en_US
dc.identifier.wosnumber	WOS:000176296800282	-
dc.citation.woscount	0	-
顯示於類別：	期刊論文