标题: | Substrate bias effect on amorphous nitrogenated carbon films deposited by filtered arc deposition |
作者: | Li, YW Shue, YB Chen, CF Yu, TC Chang, JJK 材料科学与工程学系 Department of Materials Science and Engineering |
关键字: | filtered arc deposition;amorphous-carbon;nitrogen;bias;hardnesss |
公开日期: | 1-三月-2002 |
摘要: | The effect of substrate bias and nitrogen incorporation on the structure and hardness properties of amorphous carbon (a-C) films is characterized in terms of its composition, sp(3) bonding fraction, and Raman spectra. The films' properties were analyzed using Raman spectroscopy, Auger electron spectroscopy (AES), and nanoindentation system (NIS). Experimental results indicate that a-C films were found to possess the highest hardness when deposited at a substrate bias ranging from -50 to -100 V. In addition, the hardness values do not correlate well with the Raman I(D)/I(G) ratio. The hardness of films increases with their sp(3) bonds fraction. Furthermore, nitrogen content increases with increasing substrate bias on amorphous nitrogenated carbon (a-C:N) films, and influences the growth of small graphitic crystallines. (C) 2002 Elsevier Science B.V. All rights reserved. |
URI: | http://dx.doi.org/10.1016/S0925-9635(01)00624-0 http://hdl.handle.net/11536/28980 |
ISSN: | 0925-9635 |
DOI: | 10.1016/S0925-9635(01)00624-0 |
期刊: | DIAMOND AND RELATED MATERIALS |
Volume: | 11 |
Issue: | 3-6 |
起始页: | 1227 |
结束页: | 1233 |
显示于类别: | Conferences Paper |
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