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dc.contributor.authorHuang, MGen_US
dc.contributor.authorChang, PLen_US
dc.contributor.authorChou, YCen_US
dc.date.accessioned2014-12-08T15:43:18Z-
dc.date.available2014-12-08T15:43:18Z-
dc.date.issued2001-11-01en_US
dc.identifier.issn0894-6507en_US
dc.identifier.urihttp://dx.doi.org/10.1109/66.964327en_US
dc.identifier.urihttp://hdl.handle.net/11536/29311-
dc.description.abstractThis study extends previous results for batch-service workstations to batch-service/batch-lot workstations with multiple process recipes, e.g., diffusion operations in semiconductor manufacturing. The model considered herein explicitly considers the existence of a manufacturing operation associated with multiple process recipes in the semiconductor factory. Consequently, the revised balance equations are submitted and an improved approximation is presented for this case. Based on a comparison with simulation results, this new approximation is shown to be superior to the previously developed analytical approaches. This new approximation is especially strong in cases where the number of process recipes grows, system traffic intensity is moderate, and arrival rate of each recipe is nearly the same.en_US
dc.language.isoen_USen_US
dc.titleAnalytic approximations ford multiserver batch-service work-stations with multiple process recipes in semiconductor wafer fabricationen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/66.964327en_US
dc.identifier.journalIEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURINGen_US
dc.citation.volume14en_US
dc.citation.issue4en_US
dc.citation.spage395en_US
dc.citation.epage405en_US
dc.contributor.department經營管理研究所zh_TW
dc.contributor.departmentInstitute of Business and Managementen_US
dc.identifier.wosnumberWOS:000172231100012-
dc.citation.woscount4-
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