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dc.contributor.authorChen, SYen_US
dc.contributor.authorWang, HWen_US
dc.contributor.authorHuang, LCen_US
dc.date.accessioned2014-12-08T15:43:37Z-
dc.date.available2014-12-08T15:43:37Z-
dc.date.issued2001-08-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://hdl.handle.net/11536/29485-
dc.description.abstract(Ba0.7Sr0.3)TiO3 (BST) thin films doped with La, Nb and Mg ions along with an Mg/La, Mg/Nb codopant were prepared on Pt/Ti/SiO2/Si substrates by the metal-organic deposition method. A decrease of grain size, dielectric constant, and leakage current with increasing doping levels was observed for all studied cases. The grain size, dielectric constant and leakage current increased with increasing annealing temperatures for specimens doped with a single dopant. However, the leakage current was reduced to a minimum for the codoped materials at the donor/acceptor compensated concentration and decreased with increasing annealing temperatures. The decreased leakage current of the codoped materials could be explained by the additional barrier height and width of the insulating layer caused by the defect dipoles around grain boundaries.en_US
dc.language.isoen_USen_US
dc.subjectelectrical propertiesen_US
dc.subjectBST thin filmsen_US
dc.subjectMg/La codopeden_US
dc.subjectMg/Nb codopeden_US
dc.subjectleakage currenten_US
dc.titleElectrical properties of Mg/La, Mg/Nb co-doped (Ba0.7Sr0.3)TiO3 thin films prepared by metallo-organic deposition methoden_US
dc.typeArticleen_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERSen_US
dc.citation.volume40en_US
dc.citation.issue8en_US
dc.citation.spage4974en_US
dc.citation.epage4978en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000170772700047-
dc.citation.woscount23-
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