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dc.contributor.authorMumbru, Jen_US
dc.contributor.authorSolomatine, Ien_US
dc.contributor.authorPsaltis, Den_US
dc.contributor.authorLin, SHen_US
dc.contributor.authorHsu, KYen_US
dc.contributor.authorChen, WZen_US
dc.contributor.authorWhang, WTen_US
dc.date.accessioned2014-12-08T15:43:40Z-
dc.date.available2014-12-08T15:43:40Z-
dc.date.issued2001-07-01en_US
dc.identifier.issn0030-4018en_US
dc.identifier.urihttp://dx.doi.org/10.1016/S0030-4018(01)01292-5en_US
dc.identifier.urihttp://hdl.handle.net/11536/29533-
dc.description.abstractA comparative analysis of phenanthrenequinone-doped poly(methyl methacrylate) materials fabricated at California Institute of Technology and National Chiao Tung University is performed in order to understand the differences exhibited in their recording and baking dynamics. (C) 2001 Published by Elsevier Science B.V.en_US
dc.language.isoen_USen_US
dc.subjectholographyen_US
dc.subjectphotopolymer materialen_US
dc.subjectPQ-PMMAen_US
dc.subjectgrating dynamicsen_US
dc.subjecttemperature effecten_US
dc.titleComparison of the recording dynamics of phenanthrenequinone-doped poly(methyl methacrplate) materialsen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/S0030-4018(01)01292-5en_US
dc.identifier.journalOPTICS COMMUNICATIONSen_US
dc.citation.volume194en_US
dc.citation.issue1-3en_US
dc.citation.spage103en_US
dc.citation.epage108en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000169656100011-
dc.citation.woscount35-
Appears in Collections:Articles


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