完整後設資料紀錄
DC 欄位語言
dc.contributor.authorZhang, XXen_US
dc.contributor.authorWan, CCen_US
dc.contributor.authorLiu, Hen_US
dc.contributor.authorLi, ZQen_US
dc.contributor.authorSheng, Pen_US
dc.contributor.authorLin, JJen_US
dc.date.accessioned2019-04-03T06:39:24Z-
dc.date.available2019-04-03T06:39:24Z-
dc.date.issued2001-06-11en_US
dc.identifier.issn0031-9007en_US
dc.identifier.urihttp://dx.doi.org/10.1103/PhysRevLett.86.5562en_US
dc.identifier.urihttp://hdl.handle.net/11536/29573-
dc.description.abstractNearly 3 orders of magnitude enhancement in the Hall coefficient is observed in Cu-x -(SiO2)(1-x) granular films. This large enhancement of the Hall coefficient not only is significantly larger than the prediction of the classical percolation theory, but also occurs at a metal concentration identified to be the quantum percolation threshold. Measurements of the electron dephasing length and magnetoresistance, plus the TEM characterization of microstructures, yield a physical picture consistent with the mechanism of the local quantum interference effect.en_US
dc.language.isoen_USen_US
dc.titleGiant Hall effect in nonmagnetic granular metal filmsen_US
dc.typeArticleen_US
dc.identifier.doi10.1103/PhysRevLett.86.5562en_US
dc.identifier.journalPHYSICAL REVIEW LETTERSen_US
dc.citation.volume86en_US
dc.citation.issue24en_US
dc.citation.spage5562en_US
dc.citation.epage5565en_US
dc.contributor.department物理研究所zh_TW
dc.contributor.departmentInstitute of Physicsen_US
dc.identifier.wosnumberWOS:000169239500039en_US
dc.citation.woscount62en_US
顯示於類別:期刊論文


文件中的檔案:

  1. cf6923c5e8195507912ce46076d977e1.pdf

若為 zip 檔案,請下載檔案解壓縮後,用瀏覽器開啟資料夾中的 index.html 瀏覽全文。