完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Zhang, XX | en_US |
dc.contributor.author | Wan, CC | en_US |
dc.contributor.author | Liu, H | en_US |
dc.contributor.author | Li, ZQ | en_US |
dc.contributor.author | Sheng, P | en_US |
dc.contributor.author | Lin, JJ | en_US |
dc.date.accessioned | 2019-04-03T06:39:24Z | - |
dc.date.available | 2019-04-03T06:39:24Z | - |
dc.date.issued | 2001-06-11 | en_US |
dc.identifier.issn | 0031-9007 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1103/PhysRevLett.86.5562 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/29573 | - |
dc.description.abstract | Nearly 3 orders of magnitude enhancement in the Hall coefficient is observed in Cu-x -(SiO2)(1-x) granular films. This large enhancement of the Hall coefficient not only is significantly larger than the prediction of the classical percolation theory, but also occurs at a metal concentration identified to be the quantum percolation threshold. Measurements of the electron dephasing length and magnetoresistance, plus the TEM characterization of microstructures, yield a physical picture consistent with the mechanism of the local quantum interference effect. | en_US |
dc.language.iso | en_US | en_US |
dc.title | Giant Hall effect in nonmagnetic granular metal films | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1103/PhysRevLett.86.5562 | en_US |
dc.identifier.journal | PHYSICAL REVIEW LETTERS | en_US |
dc.citation.volume | 86 | en_US |
dc.citation.issue | 24 | en_US |
dc.citation.spage | 5562 | en_US |
dc.citation.epage | 5565 | en_US |
dc.contributor.department | 物理研究所 | zh_TW |
dc.contributor.department | Institute of Physics | en_US |
dc.identifier.wosnumber | WOS:000169239500039 | en_US |
dc.citation.woscount | 62 | en_US |
顯示於類別: | 期刊論文 |