標題: | Dielectric and barrier properties of spin-on organic aromatic low dielectric constant polymers FLARE and SiLK |
作者: | Wu, ZC Shiung, ZW Wu, RG Liu, YL Wu, WH Tsui, BY Chen, MC Chang, W Chou, PF Jang, SM Hu, CH Liang, MS 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
公開日期: | 1-六月-2001 |
摘要: | This work investigates the dielectric and barrier properties of two species of organic aromatic low dielectric constant (low-k) polymers, namely, FLARE and SiLK. Experimental results indicate that both of the low-k polymers exhibit acceptable thermal stability with respect to a thermal annealing at 400 degreesC for 8 h in an N-2 ambient. Moreover, they show a good dielectric barrier property against Cu penetration under bias-temperature stressing (BTS) at 150 degreesC with an applied effective field of 0.8 MV/cm. Nevertheless, an anomalous instability of the capacitance-voltage curve was observed for the first time under BTS. This finding is explained by the proposed model of stress induced dielectric polarization charges within these organic aromatic polymers. The polarization instability may seriously degrade the long term reliability of circuit operations. (C) 2001 The Electrochemical Society. |
URI: | http://dx.doi.org/10.1149/1.1368107 http://hdl.handle.net/11536/29630 |
ISSN: | 0013-4651 |
DOI: | 10.1149/1.1368107 |
期刊: | JOURNAL OF THE ELECTROCHEMICAL SOCIETY |
Volume: | 148 |
Issue: | 6 |
起始頁: | F109 |
結束頁: | F114 |
顯示於類別: | 期刊論文 |