標題: Dielectric and barrier properties of spin-on organic aromatic low dielectric constant polymers FLARE and SiLK
作者: Wu, ZC
Shiung, ZW
Wu, RG
Liu, YL
Wu, WH
Tsui, BY
Chen, MC
Chang, W
Chou, PF
Jang, SM
Hu, CH
Liang, MS
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
公開日期: 1-六月-2001
摘要: This work investigates the dielectric and barrier properties of two species of organic aromatic low dielectric constant (low-k) polymers, namely, FLARE and SiLK. Experimental results indicate that both of the low-k polymers exhibit acceptable thermal stability with respect to a thermal annealing at 400 degreesC for 8 h in an N-2 ambient. Moreover, they show a good dielectric barrier property against Cu penetration under bias-temperature stressing (BTS) at 150 degreesC with an applied effective field of 0.8 MV/cm. Nevertheless, an anomalous instability of the capacitance-voltage curve was observed for the first time under BTS. This finding is explained by the proposed model of stress induced dielectric polarization charges within these organic aromatic polymers. The polarization instability may seriously degrade the long term reliability of circuit operations. (C) 2001 The Electrochemical Society.
URI: http://dx.doi.org/10.1149/1.1368107
http://hdl.handle.net/11536/29630
ISSN: 0013-4651
DOI: 10.1149/1.1368107
期刊: JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume: 148
Issue: 6
起始頁: F109
結束頁: F114
顯示於類別:期刊論文


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