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dc.contributor.authorCheng, HCen_US
dc.contributor.authorHong, WKen_US
dc.contributor.authorTarntair, FGen_US
dc.contributor.authorChen, KJen_US
dc.contributor.authorLin, JBen_US
dc.contributor.authorChen, KHen_US
dc.contributor.authorChen, LCen_US
dc.date.accessioned2014-12-08T15:43:58Z-
dc.date.available2014-12-08T15:43:58Z-
dc.date.issued2001-04-01en_US
dc.identifier.issn1099-0062en_US
dc.identifier.urihttp://dx.doi.org/10.1149/1.1354497en_US
dc.identifier.urihttp://hdl.handle.net/11536/29722-
dc.description.abstractA new field emission device composed of carbon nanotubes and a thin film transistor (TFT) has been successfully demonstrated to significantly improve emission stability. Carbon nanotubes are directly integrated in the drain region of the TFT and the emission current from the carbon nanotubes is controlled via the TFT drain current. The fluctuation of the emission current of the TFT-controlled carbon nanotubes can be suppressed to less than 2%, below the fluctuation of uncontrolled carbon nanotubes. The novel field emission device exhibits low-voltage controllability, good emission stability, and structural simplicity, making it promising for application to future field-emission display. (C) 2001 The Electrochemical Society.en_US
dc.language.isoen_USen_US
dc.titleIntegration of thin film transistor controlled carbon nanotubes for field emission devicesen_US
dc.typeArticleen_US
dc.identifier.doi10.1149/1.1354497en_US
dc.identifier.journalELECTROCHEMICAL AND SOLID STATE LETTERSen_US
dc.citation.volume4en_US
dc.citation.issue4en_US
dc.citation.spageH5en_US
dc.citation.epageH7en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000167347300013-
dc.citation.woscount12-
Appears in Collections:Articles