標題: RF MAGNETRON-SPUTTERED INDIUM TIN OXIDE FILM ON A REACTIVELY ION-ETCHED ACRYLIC SUBSTRATE
作者: CHIOU, BS
HSIEH, ST
電子工程學系及電子研究所
電控工程研究所
Department of Electronics Engineering and Institute of Electronics
Institute of Electrical and Control Engineering
公開日期: 25-Jun-1993
摘要: Indium tin oxide (ITO) films were deposited onto acrylic substrates with r.f. magnetron sputtering. The substrate temperature was kept below 65-degrees-C and the sputtering power was 18 W to prevent the acrylic from deformation. The adhesion strength of the ITO film on acrylic is improved by reactive ion etching (RIE) of the substrate. However, the transmission of the ITO on RIE-treated acrylic is smaller than that of the ITO on as-received acrylic. A transmission of about 83% is obtained for this low temperature, low power processed ITO film. Both the absorption coefficient and the transition energy gap are evaluated. The figure of merit of films on acrylic substrates ranges from 11.4 to 38.6 x 10(-3) OMEGA-1.
URI: http://hdl.handle.net/11536/2976
ISSN: 0040-6090
期刊: THIN SOLID FILMS
Volume: 229
Issue: 2
起始頁: 146
結束頁: 155
Appears in Collections:Articles