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dc.contributor.authorChang, KMen_US
dc.contributor.authorLee, TCen_US
dc.contributor.authorSun, YLen_US
dc.date.accessioned2014-12-08T15:44:09Z-
dc.date.available2014-12-08T15:44:09Z-
dc.date.issued2001-03-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.40.1157en_US
dc.identifier.urihttp://hdl.handle.net/11536/29823-
dc.description.abstractA rapid thermal oxynitridation process using N2O gas as the oxidant has been developed. Due to a smoother polyoxide/polysilicon interface, polyoxide grown by rapid thermal processing has better reliability than that of polyoxide grown by a conventional furnace. Moreover, in order to explore the effects of growth temperature on polyoxides, polyoxides were grown at different temperatures in this study. From this work, we find that polyoxide grown at low temperatures has better reliability than polyoxides grown at high temperature and exhibits improved characteristics such as higher breakdown electric field, less gate voltage shift, and larger charger-to-breakdown.en_US
dc.language.isoen_USen_US
dc.subjectoxynitridationen_US
dc.subjectpolyoxideen_US
dc.subjectpolysiliconen_US
dc.subjectgate voltage shiften_US
dc.subjectcharge-to-breakdownen_US
dc.titleThe effect of the growth temperature on polyoxide by rapid thermal processingen_US
dc.typeArticleen_US
dc.identifier.doi10.1143/JJAP.40.1157en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERSen_US
dc.citation.volume40en_US
dc.citation.issue3Aen_US
dc.citation.spage1157en_US
dc.citation.epage1161en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000170771500001-
dc.citation.woscount1-
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