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dc.contributor.authorLu, TCen_US
dc.contributor.authorFu, Ren_US
dc.contributor.authorShieh, HMen_US
dc.contributor.authorHuang, KJen_US
dc.contributor.authorWang, SCen_US
dc.date.accessioned2014-12-08T15:44:12Z-
dc.date.available2014-12-08T15:44:12Z-
dc.date.issued2001-02-12en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.1347019en_US
dc.identifier.urihttp://hdl.handle.net/11536/29851-
dc.description.abstractA two-wavelength integrated laser diode (TWINLD) with aluminum-free active areas (AAA) has been realized by monolithically combining two different laser material structures in a single chip utilizing the metalorganic chemical vapor deposition growth and regrowth techniques. The single TWINLD chip comprises two ridge wave-guide lasers, one is an InGaP/InGaAlP material structure for a 650 nm red laser, and another is an InGaAsP/AlGaAs material structure with AAA for a 780 nm infrared laser. The chip geometry is 300 mum long and 300 mum wide with a separation of 150 mum between two laser emission spots. The ridge widths are 3.5 and 2 mum for the red and IR laser, respectively, and both lasers emit a single transverse mode with a threshold current of 12 mA for a 650 nm laser and 14 mA for a 780 nm laser under continuous wave operation condition. (C) 2001 American Institute of Physics.en_US
dc.language.isoen_USen_US
dc.titleCharacteristics of monolithically integrated two-wavelength laser diodes with aluminum-free active layersen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.1347019en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume78en_US
dc.citation.issue7en_US
dc.citation.spage853en_US
dc.citation.epage855en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000166772600001-
dc.citation.woscount2-
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