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dc.contributor.authorHsiue, GHen_US
dc.contributor.authorShiao, SJen_US
dc.contributor.authorWei, HFen_US
dc.contributor.authorKuo, WJen_US
dc.contributor.authorSha, YAen_US
dc.date.accessioned2014-12-08T15:44:17Z-
dc.date.available2014-12-08T15:44:17Z-
dc.date.issued2001-01-10en_US
dc.identifier.issn0021-8995en_US
dc.identifier.urihttp://hdl.handle.net/11536/29901-
dc.identifier.urihttp://dx.doi.org/10.1002/1097-4628(20010110)79:2<342en_US
dc.description.abstract2- [4-(2-hydroxyphenyl)tricyclo[5.2.1.0(2,6)]dec-8-yl]phenol (HPTCDP) were prepared from dicyclopentadiene (DCPD) and phenol via Friedel-Crafts alkylation. DCPD-containing phenolic resin (DPR) was also synthesized by incorporating the DCPD-containing monomer HPTCDP with formaldehyde. DPR was further modified by grafting the phosphate group. The phosphorylation was confirmed by a Fourier transform infrared, P-31-NMR spectroscopy, and an element analysis. The phosphorus content in the DPR could be successfully tailored to give values of 3.46 to 7.79 wt % by varying the feeding ratios of the phosphorus group. The thermal stabilities of the phosphorus-containing polymers were identified by differential scanning calorimeter and thermogravimetric analysis. The glass transition temperature values were decreased as the content of phosphorus increased. High char yield 39-47 wt % in thermogravimetric analysis evaluation and limiting oxygen index values of 27 to 34 were found for all the phosphorylated phenolic resins. Such properties make these polymers highly promising for flame-retardant applications. (C) 2000 John Wiley & Sons, Inc.en_US
dc.language.isoen_USen_US
dc.subjectflame-retardanten_US
dc.subjectphosphorus-containing phenolic resinen_US
dc.subjectdicyclopentadieneen_US
dc.titleNovel phosphorus-containing dicyclopentadiene-modified phenolic resins for flame-retardancy applicationsen_US
dc.typeArticleen_US
dc.identifier.doi10.1002/1097-4628(20010110)79:2<342en_US
dc.identifier.journalJOURNAL OF APPLIED POLYMER SCIENCEen_US
dc.citation.volume79en_US
dc.citation.issue2en_US
dc.citation.spage342en_US
dc.citation.epage349en_US
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.identifier.wosnumberWOS:000165551200018-
dc.citation.woscount38-
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