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dc.contributor.authorPan, YCen_US
dc.contributor.authorWang, SFen_US
dc.contributor.authorLee, WHen_US
dc.contributor.authorLin, WCen_US
dc.contributor.authorChiang, CIen_US
dc.contributor.authorChang, Hen_US
dc.contributor.authorHsieh, HHen_US
dc.contributor.authorChen, JMen_US
dc.contributor.authorLin, DSen_US
dc.contributor.authorLee, MCen_US
dc.contributor.authorChen, WKen_US
dc.contributor.authorChen, WHen_US
dc.date.accessioned2014-12-08T15:44:24Z-
dc.date.available2014-12-08T15:44:24Z-
dc.date.issued2001en_US
dc.identifier.issn0038-1098en_US
dc.identifier.urihttp://hdl.handle.net/11536/29986-
dc.identifier.urihttp://dx.doi.org/10.1016/S0038-1098(01)00006-0en_US
dc.description.abstractX-ray absorption near-edge fine structure (XANES) spectroscopy from N K-edge measurement was employed to examine the crystal structure of metallorganic vapor phase epitaxy (MOVPE) grown Mg-doped GaN (GaN:Mg) films. The result showed that Mg doping induced crystal stacking faults to occur at the film surface causing a fraction of hexagonal phase to transform into cubic phase. As a consequence of this, XANES spectra of the films were found to vary with the dopant concentration and to lose pure hexagonal character when examined with the incident angle theta of the X-ray beam. Spectral characteristic variation between the two phases allows us to estimate the phase composition of the samples. The trend of increasing cubic phase component in dopant concentration is consistent with the observed Normaski optical micrograph. (C) 2001 Published by Elsevier Science Ltd.en_US
dc.language.isoen_USen_US
dc.subjectMg-doped GaNen_US
dc.subjectMOVPEen_US
dc.subjectcubic phaseen_US
dc.subjectXANESen_US
dc.titleStructure study of GaN : Mg films by X-ray absorption near-edge structure spectroscopyen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/S0038-1098(01)00006-0en_US
dc.identifier.journalSOLID STATE COMMUNICATIONSen_US
dc.citation.volume117en_US
dc.citation.issue10en_US
dc.citation.spage577en_US
dc.citation.epage582en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.department物理研究所zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.contributor.departmentInstitute of Physicsen_US
dc.identifier.wosnumberWOS:000167083300002-
dc.citation.woscount2-
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