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dc.contributor.authorSun, KWen_US
dc.contributor.authorChang, HYen_US
dc.contributor.authorWang, CMen_US
dc.contributor.authorWang, SYen_US
dc.contributor.authorLee, CPen_US
dc.date.accessioned2014-12-08T15:44:35Z-
dc.date.available2014-12-08T15:44:35Z-
dc.date.issued2000-12-01en_US
dc.identifier.issn0957-4484en_US
dc.identifier.urihttp://dx.doi.org/10.1088/0957-4484/11/4/307en_US
dc.identifier.urihttp://hdl.handle.net/11536/30099-
dc.description.abstractWe present a systematic investigation of the dependence of the hot-electron-optical-phonon interactions on Al composition and barrier width in GaAs/AlxGa1-xAs MQW structures. Raman scattering measurements at 15 K are presented for samples with different barrier widths and Al composition. The optical phonon energies emitted by the photoexcited electrons in quantum wells were also determined by using hot-electron-neutral acceptor luminescence techniques. It is shown that the relaxation of hot electrons in the quantum wells is dominated by the GaAs LO phonon emission for small x, but by AlAs-like LO phonons for larger Al composition. For samples with larger barriers, the electrons in the GaAs layer relax mostly through the AlAs-like optical phonon emission. However, in samples with smaller barriers, the relaxation of hot electrons is dominated by the GaAs optical phonon emission.en_US
dc.language.isoen_USen_US
dc.titleHot-electron relaxation via optical phonon emissions in GaAs/AlxGa1-xAs quantum well structures: dependence upon the alloy composition and barrier widthen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.doi10.1088/0957-4484/11/4/307en_US
dc.identifier.journalNANOTECHNOLOGYen_US
dc.citation.volume11en_US
dc.citation.issue4en_US
dc.citation.spage227en_US
dc.citation.epage232en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000165958500008-
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