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dc.contributor.authorLue, HTen_US
dc.contributor.authorHuang, BYen_US
dc.contributor.authorLue, JTen_US
dc.date.accessioned2014-12-08T15:45:11Z-
dc.date.available2014-12-08T15:45:11Z-
dc.date.issued2000-06-15en_US
dc.identifier.issn0254-0584en_US
dc.identifier.urihttp://dx.doi.org/10.1016/S0254-0584(00)00213-3en_US
dc.identifier.urihttp://hdl.handle.net/11536/30456-
dc.description.abstractPhotoluminescence (PL) and electron spin resonance (ESR) spectrometers were exploited to study the Pb defect centers in porous silicon (PS) under various heat treatments. The breaking of Si-H-x and Si-O-H bonds in PS by thermal annealing changes the emission wavelength and increases the recombination centers resulting in degrading the PL intensity. Four kinds of dangling bonds on interfaces of silicon (1 1 1), (1,-1,-1), (-1,1,-1), and (-1,-1,1) faces and SiO2 with C-3V symmetry were identified. The skeleton structure of PS collapsed under thermal annealing. Annealing in hydrogen gas, which is controvertible to the pervasive anticipation, cannot passivate the dangling bonds introduced at high temperatures. (C) 2000 Elsevier Science S.A. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectphotoluminescenceen_US
dc.subjectelectron paramagnetic resonanceen_US
dc.subjectporous siliconen_US
dc.titlePhotoluminescence and electron paramagnetic resonance studies of defect centers in porous siliconen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/S0254-0584(00)00213-3en_US
dc.identifier.journalMATERIALS CHEMISTRY AND PHYSICSen_US
dc.citation.volume65en_US
dc.citation.issue1en_US
dc.citation.spage51en_US
dc.citation.epage56en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000086933500005-
dc.citation.woscount0-
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