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dc.contributor.authorTarntair, FGen_US
dc.contributor.authorChen, LCen_US
dc.contributor.authorWei, SLen_US
dc.contributor.authorHong, WKen_US
dc.contributor.authorChen, KHen_US
dc.contributor.authorCheng, HCen_US
dc.date.accessioned2014-12-08T15:45:19Z-
dc.date.available2014-12-08T15:45:19Z-
dc.date.issued2000-05-01en_US
dc.identifier.issn1071-1023en_US
dc.identifier.urihttp://dx.doi.org/10.1116/1.591362en_US
dc.identifier.urihttp://hdl.handle.net/11536/30548-
dc.description.abstractArrays of carbon nanotubes (CNT) and diamond-clad Si tips were grown by microwave plasma-enhanced chemical vapor deposition. The former ones were grown directly on prepatterned cobalt-coated silicon substrate, while the latter ones were grown on Si-tip arrays. Each array contains 50 x 50 emitting cells and each individual cell is 3 mu m square. A maximum effective emission current density of about 17 A/cm(2) (at a macroscopic field of 17.5 V/mu m) has been demonstrated, while a macroscopic emission current density of 10 mA/cm(2) with operating fields around 10 V/mu m can be routinely achieved from an an ay of CNT emitters. In contrast, operating fields above 20 V/mu m were needed to draw a comparable emission current density from all of the diamond-clad Si tips arrays. Emission stability test performed at 40 mA/cm(2) for CNT arrays also showed little sign of degradation. Due to the high efficiency of electron emission, simple sample process, and large area growth capability, field emitter arrays based on CNT are attractive for flat panel display applications. (C) 2000 American Vacuum Society. [S0734-211X(00)08003-3].en_US
dc.language.isoen_USen_US
dc.titleHigh current density field emission from arrays of carbon nanotubes and diamond-clad Si tipsen_US
dc.typeArticleen_US
dc.identifier.doi10.1116/1.591362en_US
dc.identifier.journalJOURNAL OF VACUUM SCIENCE & TECHNOLOGY Ben_US
dc.citation.volume18en_US
dc.citation.issue3en_US
dc.citation.spage1207en_US
dc.citation.epage1211en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000087654200016-
dc.citation.woscount40-
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