| 標題: | Fermi and anti-Fermi glass transition and subband resonant quantum tunneling in Nb/Ti metallic multilayer films |
| 作者: | Lue, JT Liang, SY Lee, YW Lue, HT 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
| 公開日期: | 1-四月-2000 |
| 摘要: | Multilayer of Nb/Ti and NbN/Ti films with 30 periodic structure were sputtered onto silicon substrates. The current-voltage characteristics measured along the vertical junction at low temperatures exhibit nonlinear step-wise curves. The resonant subband quantum tunneling in the metallic multiple quantum wells can satisfactorily express these peculiar behaviors. The Fermi and anti-Fermi glass transition showing itinerant metallic and insulating conduction properties are also observed at low currents and near critical temperatures. |
| URI: | http://hdl.handle.net/11536/30633 |
| ISSN: | 0577-9073 |
| 期刊: | CHINESE JOURNAL OF PHYSICS |
| Volume: | 38 |
| Issue: | 2 |
| 起始頁: | 339 |
| 結束頁: | 344 |
| 顯示於類別: | 會議論文 |

