完整後設資料紀錄
DC 欄位語言
dc.contributor.authorWu, THen_US
dc.contributor.authorWu, JCen_US
dc.contributor.authorWu, CSen_US
dc.contributor.authorChen, BMen_US
dc.contributor.authorShieh, HPDen_US
dc.date.accessioned2014-12-08T15:45:44Z-
dc.date.available2014-12-08T15:45:44Z-
dc.date.issued2000-02-01en_US
dc.identifier.issn0304-8853en_US
dc.identifier.urihttp://dx.doi.org/10.1016/S0304-8853(99)00693-9en_US
dc.identifier.urihttp://hdl.handle.net/11536/30761-
dc.description.abstractThe micro-strips with patterned magnetic domains using electron beam lithography have been made to study the geometric shape dependence of coercivity. The size of the micro-strip is 10 mu m x 30 mu m with 0.5 mu m periods hole arrays pattern. Arrays with different types of geometry, such as square- circle-, and ellipse-shapes have been made. amorphous rear-earth transition-metal (RE-TM) thin films with magnetic perpendicular anisotropy were deposited on the microstrips. The extraordinary Hall effect has been employed to measure the hysteresis loop and the coercivity of the sample. We have found that for the same deposited material, the magnitude of coercivity for various shapes are dissimilar. For example, the coercivity of the ellipse-shaped hole arrays is much larger than the coercivity of the square-shaped hole arrays. In addition, we observed that the coercivity of the patterned sites was larger than the sites without patterns for RE-dominated compounds and the coercivity of the patterned sites was smaller than the sites without patterns for TM-dominated compounds. The magnetic moments canting between RE and TM subnetworks will be used to explain the observed phenomena. (C) 2000 Elsevier Science B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectcoercivityen_US
dc.subjectE-beam lithographyen_US
dc.subjectmicro-structureen_US
dc.subjectshaped-dependenceen_US
dc.subjectcantingen_US
dc.titleGeometric shape dependence of coercivity for patterned magnetic thin filmsen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.doi10.1016/S0304-8853(99)00693-9en_US
dc.identifier.journalJOURNAL OF MAGNETISM AND MAGNETIC MATERIALSen_US
dc.citation.volume209en_US
dc.citation.issue1-3en_US
dc.citation.spage220en_US
dc.citation.epage223en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000085022700062-
顯示於類別:會議論文


文件中的檔案:

  1. 000085022700062.pdf

若為 zip 檔案,請下載檔案解壓縮後,用瀏覽器開啟資料夾中的 index.html 瀏覽全文。