完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Sun, KW | en_US |
dc.contributor.author | Sun, CK | en_US |
dc.contributor.author | Wang, JC | en_US |
dc.contributor.author | Wang, SY | en_US |
dc.contributor.author | Lee, CP | en_US |
dc.date.accessioned | 2014-12-08T15:45:53Z | - |
dc.date.available | 2014-12-08T15:45:53Z | - |
dc.date.issued | 2000 | en_US |
dc.identifier.issn | 0038-1098 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/30856 | - |
dc.identifier.uri | http://dx.doi.org/10.1016/S0038-1098(00)00189-7 | en_US |
dc.description.abstract | We have studied carrier dynamics among highly nonequilibrium carrier distributions generated with femtosecond laser pulses in Be:AlxGa1-xAs/GaAs quantum wells with different well width at hot carrier densities between 10(9) and 10(11) cm(-2). The spectra, at moderately high densities (greater than or equal to 10(10) cm(-2)) indicate that the initially narrow electron distribution is altered in a time less than or equal to the LO-phonon emission time, as a result of rapid carrier-carrier scattering. At an excitation density of about 10(10) cm(-2), the carrier-carrier scattering rate is faster in narrower quantum wells. By measuring the intensity of the unrelaxed peak, it is possible to determine the relative rates of carrier-carrier scattering and LO-phonon emission. Our results indicate that carrier-carrier scattering becomes as significant as LO-phonon emission at a density of about 1 x 10(10) cm(-2) in the 5 nm quantum wells. (C) 2000 Elsevier Science Ltd. All rights reserved. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | quantum wells | en_US |
dc.subject | electron-electron interactions | en_US |
dc.subject | optical properties | en_US |
dc.subject | luminescence | en_US |
dc.title | Carrier-carrier scattering: an experimental comparison of 5 and 3 nm AlxGa1-xAs/GaAs quantum wells | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1016/S0038-1098(00)00189-7 | en_US |
dc.identifier.journal | SOLID STATE COMMUNICATIONS | en_US |
dc.citation.volume | 115 | en_US |
dc.citation.issue | 6 | en_US |
dc.citation.spage | 329 | en_US |
dc.citation.epage | 333 | en_US |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:000087830800011 | - |
dc.citation.woscount | 2 | - |
顯示於類別: | 期刊論文 |