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dc.contributor.authorSun, KWen_US
dc.contributor.authorSun, CKen_US
dc.contributor.authorWang, JCen_US
dc.contributor.authorWang, SYen_US
dc.contributor.authorLee, CPen_US
dc.date.accessioned2014-12-08T15:45:53Z-
dc.date.available2014-12-08T15:45:53Z-
dc.date.issued2000en_US
dc.identifier.issn0038-1098en_US
dc.identifier.urihttp://hdl.handle.net/11536/30856-
dc.identifier.urihttp://dx.doi.org/10.1016/S0038-1098(00)00189-7en_US
dc.description.abstractWe have studied carrier dynamics among highly nonequilibrium carrier distributions generated with femtosecond laser pulses in Be:AlxGa1-xAs/GaAs quantum wells with different well width at hot carrier densities between 10(9) and 10(11) cm(-2). The spectra, at moderately high densities (greater than or equal to 10(10) cm(-2)) indicate that the initially narrow electron distribution is altered in a time less than or equal to the LO-phonon emission time, as a result of rapid carrier-carrier scattering. At an excitation density of about 10(10) cm(-2), the carrier-carrier scattering rate is faster in narrower quantum wells. By measuring the intensity of the unrelaxed peak, it is possible to determine the relative rates of carrier-carrier scattering and LO-phonon emission. Our results indicate that carrier-carrier scattering becomes as significant as LO-phonon emission at a density of about 1 x 10(10) cm(-2) in the 5 nm quantum wells. (C) 2000 Elsevier Science Ltd. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectquantum wellsen_US
dc.subjectelectron-electron interactionsen_US
dc.subjectoptical propertiesen_US
dc.subjectluminescenceen_US
dc.titleCarrier-carrier scattering: an experimental comparison of 5 and 3 nm AlxGa1-xAs/GaAs quantum wellsen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/S0038-1098(00)00189-7en_US
dc.identifier.journalSOLID STATE COMMUNICATIONSen_US
dc.citation.volume115en_US
dc.citation.issue6en_US
dc.citation.spage329en_US
dc.citation.epage333en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000087830800011-
dc.citation.woscount2-
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