標題: SIMULTANEOUS OCCURRENCE OF MULTIPHASES IN THE INTERFACIAL REACTIONS OF ULTRAHIGH-VACUUM DEPOSITED HF AND CR THIN-FILMS ON (111)SI
作者: HSIEH, WY
LIN, JH
CHEN, LJ
交大名義發表
材料科學與工程學系
National Chiao Tung University
Department of Materials Science and Engineering
公開日期: 8-三月-1993
摘要: Simultaneous occurrence of multiphases were observed in the interfacial reactions of ultrahigh vacuum deposited Hf and Cr thin films on (111) Si by high-resolution transmission electron microscopy in conjunction with fast Fourier transform diffraction analysis and image simulation. For Hf/Si system, an amorphous interlayer, Hf5Si3 as well as FeB and CrB types of HfSi were found to form simultaneously in samples annealed at 530-degrees-C for 40-80 min. For Cr/Si system, an amorphous interlayer, Cr5Si3, CrSi, and CrSi2 were observed to form in samples annealed at 375-degrees-C for 30 min. The formation of multiphases appeared to be quite general in the initial stages of interfacial reactions of ultrahigh vacuum deposited refractory thin films. The results called for a reexamination of generally accepted ''difference'' in reaction sequence between bulk and thin-film couples.
URI: http://dx.doi.org/10.1063/1.108803
http://hdl.handle.net/11536/3089
ISSN: 0003-6951
DOI: 10.1063/1.108803
期刊: APPLIED PHYSICS LETTERS
Volume: 62
Issue: 10
起始頁: 1088
結束頁: 1090
顯示於類別:期刊論文