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dc.contributor.authorKuo, WKen_US
dc.contributor.authorHuang, YTen_US
dc.contributor.authorHuang, SLen_US
dc.date.accessioned2014-12-08T15:46:03Z-
dc.date.available2014-12-08T15:46:03Z-
dc.date.issued1999-11-15en_US
dc.identifier.issn0146-9592en_US
dc.identifier.urihttp://hdl.handle.net/11536/30968-
dc.description.abstractA new technique for three-dimensional (3D) electric-field (e-field) vector measurement is presented. Three laser beams with different propagation paths in an electro-optic (EO) crystal were used to resolve 3D components of e-field vectors. We adopted a special geometric shape of bismuth silicon oxide EO crystal so that the three beams would propagate within it. A sensitivity of 0.6 V/cm root Hz was achieved. A commercial Ansoft Maxwell 3D field simulator was also used to verify our measurements. (C) 1999 Optical Society of America.en_US
dc.language.isoen_USen_US
dc.titleThree-dimensional electric-field vector measurement with an electro-optic sensing techniqueen_US
dc.typeArticleen_US
dc.identifier.journalOPTICS LETTERSen_US
dc.citation.volume24en_US
dc.citation.issue22en_US
dc.citation.spage1546en_US
dc.citation.epage1548en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000083745900002-
dc.citation.woscount9-
Appears in Collections:Articles


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