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dc.contributor.authorKwei, CMen_US
dc.contributor.authorChiou, SYen_US
dc.contributor.authorLi, YCen_US
dc.date.accessioned2014-12-08T15:46:28Z-
dc.date.available2014-12-08T15:46:28Z-
dc.date.issued1999-06-15en_US
dc.identifier.issn0021-8979en_US
dc.identifier.urihttp://hdl.handle.net/11536/31279-
dc.description.abstractAn overlayer system composed of a thin film on the top of a semi-infinite substrate was studied in this work for electron inelastic interactions. Analytical expressions for the depth-dependent inelastic differential and integral inverse mean free paths were derived for both incident and escaping electrons. The interface (film-substrate) effect and the surface (vacuum-film) effect were analyzed by comparing the results of an overlayer system and a semi-infinite system. It was found that the interface effect extended to several angstroms on both sides of the interface for a 500 eV electron incident into or escaping from the vacuum-SiO2-Si and the vacuum-Au-Ni systems. An application of the spatial-varying inelastic differential inverse mean free paths was made by Monte Carlo simulations of the electron elastic backscattering from an overlayer system. Good agreement was found between results calculated presently and data measured experimentally on the elastic reflection coefficient. (C) 1999 American Institute of Physics. [S0021-8979(99)00712-4].en_US
dc.language.isoen_USen_US
dc.titleElectron inelastic interactions with overlayer systemsen_US
dc.typeArticleen_US
dc.identifier.journalJOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume85en_US
dc.citation.issue12en_US
dc.citation.spage8247en_US
dc.citation.epage8254en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000080517000032-
dc.citation.woscount13-
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