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dc.contributor.authorLin, MSen_US
dc.contributor.authorWang, MWen_US
dc.contributor.authorCheng, LAen_US
dc.date.accessioned2014-12-08T15:47:04Z-
dc.date.available2014-12-08T15:47:04Z-
dc.date.issued1999en_US
dc.identifier.issn0141-3910en_US
dc.identifier.urihttp://hdl.handle.net/11536/31588-
dc.identifier.urihttp://dx.doi.org/10.1016/S0141-3910(99)00085-3en_US
dc.description.abstractBisphenol-A diacrylate (BADA) was synthesized from the reaction of bisphenol-A and acrylol chloride. Interpenetrating polymer networks (IPNs) based on diglycidyl ether of bisphenol-A. (DGEBA) and BADA in weight ratios of DGEBA/BADA = 100/0, 75/25 and 50/50 were prepared by using 4,4'-diaminodiphenylmethane (MDA) and benzoyl peroxide (BPO) as curing agents. Samples were irradiated with ultraviolet in a Q-WA weather-o-meter to study their aging behavior. Experimental results indicated that the BADA thus incorporated in the IPN structure confers significant photostabilization of the epoxy, as shown by less chain scission at C-O-C in the epoxy, with less property loss in mechanical tests. (C) 1999 Elsevier Science Ltd. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectIPNen_US
dc.subjectagingen_US
dc.subjectphotostabilizationen_US
dc.subjectchain scissionen_US
dc.titlePhotostabilization of an epoxy resin by forming interpenetrating polymer networks with bisphenol-A diacrylateen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/S0141-3910(99)00085-3en_US
dc.identifier.journalPOLYMER DEGRADATION AND STABILITYen_US
dc.citation.volume66en_US
dc.citation.issue3en_US
dc.citation.spage343en_US
dc.citation.epage347en_US
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.identifier.wosnumberWOS:000083330200006-
dc.citation.woscount5-
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